The present invention provides new technological solution in order to protect surfaces of polymer materials against environmental impact (direct flame, moisture, microorganisms, etc.). Deposition of SiO2, TiO2 and combined SiO2-TiO2 nanocrystalline thin films is performed using reactive magnetron sputtering technique. This invention covers combined two-step method: change of polymer surface energy using low-temperature plasma activation (Tions ≤ 105 K) in order to improve oxide films adhesion on polymer surface; formation of thin oxide films in reactive Ar+O2 gas environment.
LT Patent number: 6291
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